Measurement configuration optimization for accurate grating reconstruction by Mueller matrix polarimetry
نویسندگان
چکیده
منابع مشابه
ellipsometry and Mueller matrix polarimetry
We characterized two samples consisting of photoresist layers on silicon with square arrays of square holes by spectroscopic ellipsometry (SE) and Mueller matrix polarimetry (MMP). Hole lateral dimensions and depths were determined by fitting either SE data taken in conventional planar geometry or MMP data in general conical diffraction configurations. A method for objective determination of th...
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ژورنال
عنوان ژورنال: Journal of Micro/Nanolithography, MEMS, and MOEMS
سال: 2013
ISSN: 1932-5150
DOI: 10.1117/1.jmm.12.3.033013